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Product infos:

Film Stress Mapping System

Promulgator: :admin  Send date: :2011-09-23 16:39  Visitor: :
Product infos:
Introduce:

The kSA MOS Ultra-Scan is a flexible, high-resolution scanning curvature and tilt-measurement system. Based on the proven technology of our standard in-situ kSA MOS system, the Ultra-Scan uses a laser array to map the two-dimensional curvature and stress of semiconductor wafers, optical mirrors, lenses—
practically any polished surface. The standard system provides a 200mm x,y scanning range with 2 μm resolution. Optionally, larger scanning stages (up to 300mm x,y scanning range with 4 μm resolution) are available. Scans are fully programmable for selected area, line scan, or full area map. The system also
provides quantitative film stress analysis with full area map by first scanning the bare substrate and then re-scanning the sample post-process.

Features:
• Map the 2D curvature of semiconductor wafers, optical mirrors, lenses, or practically any polished surface
• Patented Multi-beam Optical Sensor (MOS) technology
• 200mm x,y scanning range with 2 μm spatial resolution
• Quantitative film stress analysis map
• Real time plotting of curvature, radius of curvature, stress-thickness product, stress, and tilt
• Vibration controlled environment
• Scans fully programmable for selected area, line scan, or full area map


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