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Product infos:

thermal stress analyser

Promulgator: :admin  Send date: :2011-09-23 16:52  Visitor: :
Product infos:
Introduce:

Leveraging k-Space Associates’ expertise in integrating critical thin film metrology equipment, the MOS Thermal Scan system utilizes the patented MOS (Multi-beam Optical Sensor) stress measurement technology to provide unparalleled curvature, stress, and bow height resolution and repeatability.  The system is configured with a high performance vacuum process chamber utilizing advanced rapid thermal annealing heaters and holders to maintain wafer temperature stability anduniformity across the entire rated temperature range from room temperature to 400°C.  The high-resolution, sub-micron linear scanning stage ensures accurate, user programmable 2D scanning on samples as small as 10mm and up to 300mm.   Measurements can be performed at stabilized temperatures using 2D scans or during thermal cycling processes using rapid data acquisition at a single wafer point to ensure accurate stress information is obtained.  Measurements can be made during introduction of process gas, with one manually controlled gas lines included in the standard product configuration.  Patented multiple-spot laser array and auto-intensity feedback control ensures kSA MOS technology is compatible with most patterned substrates.

Features:
Maximum substrate size: May holds up to 300mm
Substrate temperature range: RT to 1000ºC
Rapid thermal annealing Vacuum chamber,achieve 500 mTorr base pressure
   Temperature uniformity: better than ± 2°C.
Complete kSA Multi-beam Optical Sensor (MOS) System for measuring thin film curvature and stress
   Patented laser array technology provides localized 2-dimensional curvature and stress measurement
   Patented, Automated Mirror Tracking with Servo Controland auto-intensity laser control
   Curvature Accuracy:  Better than 0.5%
   Curvature Repeatability:<2×10-5


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